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Molybdenum Sputtering Target Monb Target Mota Target

Molybdenum Sputtering Target Monb Target Mota Target

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Molybdenum Sputtering Target Bonding Elmet

Molybdenum Sputtering Target Bonding Elmet

Molybdenum Sputtering Targets Strip, Square and Monolithic. Elmet is a leading global provider of high quality bonded and un-bonded molybdenum sputtering target products for all current and legacy sizes from generation 1 to 8.5. We produce a number of Molybdenum and Tungsten based alloys suitable for coatings such as Mo, MoTa, and Tungsten.

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Molybdenum cathodic sputtering target Plansee SE

Molybdenum Cathodic Sputtering Target Plansee Se

Targets from Plansee are maximum dense, highly pure and show a homegenous microstructure. Therefore higher sputtering speeds, minimized particle formation during the process and homogenous layers are guaranteed. Available molybdenum alloys MoTa, MoNb, MoNa, MoW You can choose between our single and multi-piece planar targets.

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Molybdenum Niobium sputtering target

Molybdenum Niobium Sputtering Target

Name Molybdenum Niobium sputtering target Molecular formula Mo90Nb10wt, MoNb Color black Brand Name CRM Purity 99.95min biggest size Disc 18 inch 457.2mm diameter 450mmx125mm or 420mmx200mm or 360mmx300mm or

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Advanced Metal Sputtering Targets for Thin Film Production

Advanced Metal Sputtering Targets For Thin Film Production

May 12, 2017 Product compositions range from high purity tungsten and molybdenum to MoW, MoNb, MoTi, MoNb, etc. Rotary sputtering targets are manufactured in bonded and monolithic configurations and measure 4 m or longer. Planar sputtering targets range in generation sizes including the Gen 5.5 molybdenum target with area dimensions of 1580x 1950 mm.

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HC Starck Introduces MoNb and MoW Sputtering Targets

Hc Starck Introduces Monb And Mow Sputtering Targets

H.C. Starck is taking innovation to a new level with its hottest new sputtering alloys for Touch Screen Panel TSP applications. Curved and flexible touch screens are the latest in HDTV, smart phones, tablets and mobile device technology. Touch screens use H.C. Starcks molybdenum-niobium MoNb targets to sputter thin films for barrier, capping and conducting layers in these devices.

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Sputtering Targets AMERICAN ELEMENTS

Sputtering Targets American Elements

Sputtering Targets Overview About Sputtering Deposition. Sputtering deposition is one of the most common processes used for thin film deposition the coating of a surface with a layer of material ranging from fractions of a nanometer to several micrometers in thickness.Thin film deposition is essential to manufacturing of many modern electronic and optical components

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Sputtering Targets

Sputtering Targets

Princeton Scientific Corp. offers Sputtering targets made of - Metals, non-metals and chemical compounds with purity from 99.9 to 99.9999. We offer standard, single element pure metals and custom compounds. Various geometric shapes round, rectangular, as well as multi-tile and stepped constructions are possible. Please review our standard and specialty

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Sputtering Targets Tantalum Properties

Sputtering Targets Tantalum Properties

Sputtering Targets . Tantalum ingots, used in the production of tantalum sputtering targets, are electron beam EB melted, and have inherently high purity due to a combination of high vacuum settings, slow melting rates, multiple furnace passes, and careful control of all aspects of the process.

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Products Suzhou chengzeyu coating technology co

Products Suzhou Chengzeyu Coating Technology Co

MoNb Rotating Sputtering Target. Nb Rotating Sputtering Target. NiCu Rotating Sputtering Target. ... Copper Indium Gallium Selenium Sputtering Target, CIGS. Cadmium Sulfide,CdS. ... Molybdenum oxide, MoOxTantalum oxide, Ta2Ox. Product.

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Sputtering target custom manufacturing company

Sputtering Target Custom Manufacturing Company

Dec 03, 2020 Sputtering target customization Xinkang New Material Co., Ltd. specializes in custom manufacturing various sputtering targets. We have many raw material compound production lines, such as semiconductor production lines, chemical compound production lines, metallurgical production lines, powder grinding production lines, etc.

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Flat Panel Display Sputtering Targets Manufacturer PVD

Flat Panel Display Sputtering Targets Manufacturer Pvd

Flat Panel Display industry now becomes one of the biggest Sputtering targets application market. As the manufacturer of sputtering targets for the Flat Panel Display industry, our sputtering targets are custom-engineered to fit your most exacting specifications for TVs, PCs, and Mobile Devices.

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Nickel Vanadium Sputtering Target NiV PVD Target

Nickel Vanadium Sputtering Target Niv Pvd Target

The picture below are two micrographs of our NiV937 wt alloy sputtering target, the average grain size100m. The NiV sputtering targets we produced are high purity, its most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process.

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Sputtering Target Manufacturer and Sputter Target Export

Sputtering Target Manufacturer And Sputter Target Export

We are professional sputtering target manufacturer and provide high quality of China sputter target, and these sputter target are in hot sale around the world. ... Rotatable MoNb target. Model RT-Molybdenum Niobium . Rotatable Nb target. Model RT-Niobium ...

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Alloy Sputtering Targets Price 2021 Alloy Sputtering

Alloy Sputtering Targets Price 2021 Alloy Sputtering

Alloy Sputtering Targets Price - Select 2021 high quality Alloy Sputtering Targets Price products in best price from certified Chinese Alloy Tube manufacturers, Alloy Steel Sheets suppliers, wholesalers and factory on Made-in-China.com

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Sputtering Target Bonding Elmet Technologies

Sputtering Target Bonding Elmet Technologies

Sputtering Target Bonding. Elmet manufactures molybdenum, MoTa, and tungsten sputtering targets that meet the needs of leaders in flat panel display, semiconductor, and other industries. Our manufacturing process is fully integrated from beginning to end from the raw metal powder through to the finished target, enabling our engineers to closely monitor and control product properties ...

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Molybdenum Niobium MoNb Sputtering Targets Alloy

Molybdenum Niobium Monb Sputtering Targets Alloy

Sputtering technique are frequently used to create a thin film of Molybdenum Niobium . The MoNb target material is placed on the electrode in the sputtering chamber. Heavy ion particle or laser are frequently used to ejecting coating material from the target, made by Molybdenum Niobium in this case, to create a thin film of MoNb on the ...

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MoNb Target TRM Refractory Material Specialist

Monb Target Trm Refractory Material Specialist

T he molybdenum niobium alloy target MoNb Target is the key material of the flat panel display industry, and the typically content is 90 of molybdenum and 10 of niobium. It uses the electron-beam evaporation to deposit the molybdenum element and the niobium element at the emitter tip. Farseeing, it has an immeasurable future for developing large screens and high definition screens.

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MolybdenumBased Sputtering Targets in Flat Panel Displays

Molybdenumbased Sputtering Targets In Flat Panel Displays

May 12, 2017 The largest planar sputtering target available from H.C. Starck Solutions is the Gen 5.5 molybdenum plate, with an expanded width of 1580 x 1950mm. H.C. Starck Solutions manufactures molybdenum sputtering targets and machined targets for Gen 1 to 8 sputtering

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Preparation of Molybdenum Sputtering Targets by Powder

Preparation Of Molybdenum Sputtering Targets By Powder

Preparation of Molybdenum Sputtering Targets by Powder Metallurgy. Molybdenum film has many advantages such as good electrical conductivity and thermal stability, chemical resistance, and low thermal expansion coefficient. It has been widely used in solar power generation, computer circuits, flat panel displays, storage media, and other aspects

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CN102321871A Hot isostatic pressing is produced the

Cn102321871a Hot Isostatic Pressing Is Produced The

Hot isostatic pressing is produced the method for flat-panel monitor with the molybdenum alloy sputtering target material Molybdenum materials passes through suitable 1000 1500 100200MPa hip treatment on the basis that density improves, can obtain tiny and uniform grain fineness number and intensity and toughness and all be improved.Under the acting in conjunction of

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HC Starck introduces MoNb and MoW sputtering targets

Hc Starck Introduces Monb And Mow Sputtering Targets

Mar 18, 2015 The MoNb alloy enables higher sputtering rates, higher quality film with fewer defects and world-class corrosion resistance. Production of single piece targets, the company states, is one of H.C. Starcks advantages. Another stated advantage is the higher relative density found in extruded targets compared to Hot Isostatic Press HIP targets.

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Sputtering target Manufacturers amp Suppliers China

Sputtering Target Manufacturers Amp Suppliers China

sputtering target manufacturersupplier, China sputtering target manufacturer amp factory list, find qualified Chinese sputtering target manufacturers, suppliers, factories, exporters amp wholesalers quickly on Made-in-China.com., page 2

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Tantalum Molybdenum Sputtering Target American

Tantalum Molybdenum Sputtering Target American

American Elements specializes in producing high purity Tantalum Molybdenum sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition CVD and physical vapor deposition PVD display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target ...

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Molybdenum Copper alloy sputtering target MoCu PVD

Molybdenum Copper Alloy Sputtering Target Mocu Pvd

Molybdenum copper MoCu alloy targets are generally golden yellow, flat in shape, with purity of 99.95. They are prepared by powder technology. Mo Cu alloy is a pseudo alloy composed of two kinds of non solid melting metals, which has the characteristics of both Mo and Cu.

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